4Tex wet-bench component in cleanroom operation

Applications

Process chemistry under control — at every process step

4Tex systems are used wherever ultra-pure fluids must be precisely temperature-controlled, safely supplied and handled contamination-free.

Wet-chemistry process station for wafer treatment in the cleanroom

Wet processing

Precisely temperature-controlled wet chemistry

For etch, clean and wet-chemistry processes, the I²R heater delivers precisely controlled process temperatures — with rapid response and no contamination from metallic surfaces.

Ultra-high-purity fluidics with PFA tubing and process pumps

Ultra Pure Fluids

Ultra Pure Water, acids, bases and solvents

The metal-free construction from PTFE and PFA makes 4Tex systems compatible with ultra-pure water as well as acids, bases and aggressive process chemicals — while maintaining purity.

Point of use heating

Heating directly at the point of use

Thanks to the low internal volume of 60 ml and the rapid thermal response, the I²R heater is ideal for heating directly at the process point — with minimal dead volume and minimal chemical inventory.

Further areas

From wafer fabrication to packaging

Semiconductor solutions

Contamination-free process chemistry for front-end fabrication steps.

Chemical delivery

Safe, controlled supply and dosing of process chemicals via the bCDS series.

Wafer manufacturing

Stable, repeatable process conditions for wafer processing.

Advanced packaging

Precise temperature control for plating and packaging processes.

Contamination-free processing

Metal-free fluid path eliminates particle and metal contamination.

Thermal & fluid control

Integrated temperature and flow monitoring for stable processes.

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