4Tex wet-bench component in cleanroom operation

Applications

Process chemistry under control — at every process step

4Tex systems are used wherever ultra-pure fluids must be precisely temperature-controlled, safely supplied and handled contamination-free.

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Wet-chemistry process station for wafer treatment in the cleanroom

Wet processing

Precisely temperature-controlled wet chemistry

For etch, clean and wet-chemistry processes, the I²R heater delivers precisely controlled process temperatures — with rapid response and no contamination from metallic surfaces.

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Ultra-high-purity fluidics with PFA tubing and process pumps

Ultra Pure Fluids

Ultra Pure Water, acids, bases and solvents

The metal-free construction from PTFE and PFA makes 4Tex systems compatible with ultra-pure water as well as acids, bases and aggressive process chemicals — while maintaining purity.

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Point of use heating

Heating directly at the point of use

Thanks to the low internal volume of 60 ml and the rapid thermal response, the I²R heater is ideal for heating directly at the process point — with minimal dead volume and minimal chemical inventory.

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Further areas

From wafer fabrication to process monitoring

4Tex systems secure precisely temperature-controlled, contamination-free process chemistry across the entire wet-process flow — from wafer fabrication through to monitoring the process chemistry.